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      "description": "Advanced Contour-based Pattern Metrology Software including Automated Image Acquisition for SEM Integrated Metrology and Inspection for Your SEM: New Software Suite and Upgrade Kit GenISys - Advancing the Standard We provide flexible, high-performance software solutions for the optimization of micro and nano fabrication as well as metrology and inspection, to give engineers, manufacturers, and tool suppliers unparalleled efficiency and optimal value in research, development, and production of future nano technologies. BEAMER , introduced in 2006, has become the de-facto standard for e-beam direct write pattern processing. Most major nano-fabrication centers worldwide use BEAMER and TRACER to"
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